Wiley_Advanced Materials Technologies

Volume8, Issue1

January 10, 2023

2370001

High-Performance Nanostructured Flexible Capacitor by Plasma-Induced Low-Temperature Atomic Layer Annealing (Adv. Mater. Technol. 1/2023)

In article number 2201134, Jong G. Ok, Jihwan An, and co-workers demonstrate simple yet effective two-fold strategies to directly fabricate flexible thin film capacitors on polymer substrate: the crystallization of high-k TiO2 film by plasma-assisted atomic layer annealing at low temperature of 80 °C on nanostructured polycarbonate substrates fabricated by simple dynamic nanoinscribing technique, which results in the flexible capacitor of the record-high capacitance density (24.2 nF/mm2) with mechanical stability.

• Jaehyeong Lee
• Dohyun Go
•  Useung Lee
• Seunghyeon Lee
• Keun Hoi Kim
•  Jeong Woo Shin
• Hyein Kim
• Jong G. Ok
• Jihwan An

High‐Performance Nanostructured Flexible Capacitor by Plasma‐Induced Low‐Temperature Atomic Layer Annealing (Adv. Mater. Technol. 1/2023) - Lee - 2023 - Advanced Materials Technologies - Wiley Online Library

Image created by minjeong Kim / Nanosphere